We consider the inverse problem of determining an optical mask that produces a desired circuit pattern in photolithography. We set the problem as a shape design problem in which the unknown is a two-dimensional domain. The relationship between the target shape and the unknown is modeled through diffractive optics. We develop a variational formulation that is well-posed and propose an approximation that can be shown to have convergence properties. The approximate problem can serve as a foundation to numerical methods, much like the Ambrosio-Tortorelli's approximation of the Mumford-Shah functional in image processing.
|Titolo:||Analysis of an inverse problem arising in photolithography|
RONDI, LUCA (Corresponding)
|Parole Chiave:||photolithograpy; shape optimization; sets of finite perimeter; Gamma-convergence|
|Settore Scientifico Disciplinare:||Settore MAT/05 - Analisi Matematica|
|Data di pubblicazione:||2012|
|Digital Object Identifier (DOI):||10.1142/S0218202511500266|
|Appare nelle tipologie:||01 - Articolo su periodico|