Dual Pulsed Laser Deposition system for the growth of complex materials and heterostructures

Here we presented an integrated ultra-high-vacuum (UHV) apparatus for the growth of complex materials and heterostructures. The specific growth technique is the Pulsed Laser Deposition by means of a dual-lasers source based on an excimer KrF ultra-violet and solid-state Nd:YAG infra-red lasers. By taking advantage of the two laser sources - both lasers can be independently used within the deposition chambers - a large number of different materials - ranging from oxides to metals, to selenides and others - can be successfully grown in the form of thin films and heterostructures. All of the samples can be in-situ transferred between the deposition chambers by using vessels and holders’ manipulators. The apparatus also offers the possibility to transfer elsewhere samples in UHV condition by means of commercially available UHV-suitcases. The Dual-PLD operates for in-house research as well as user facility in combination with the Advanced Photo-Emission (APE) beamline at the Elettra synchrotron radiation facility in Trieste and allows synchrotron-based photo-emission experiments on untreated films and heterostructures.