The electrical properties of a Single Hole Field Effect Transistor (SH-FET) based on CMOS technology are analyzed in a cryogenic environment. Few electron-hole Coulomb diamonds are observed using quantum transport spectroscopy measurements, down to the limit of single hole transport. Controlling the hole filling of the SH-FET is made possible by biasing the top gate, while the bulk contact is employed as a back gate that tunes the hole state coupling with the contacts and their distance from the interface. We compare the cryogenic Coulomb blockade regime with the room temperature regime, where the device operation is similar to that of a standard p-MOSFET.

Tunable single hole regime of a silicon field effect transistor in standard CMOS technology / M. Turchetti, H. Homulle, F. Sebastiano, G. Ferrari, E. Charbon, E. Prati. - In: APPLIED PHYSICS EXPRESS. - ISSN 1882-0778. - 9:1(2016), pp. 014001.1-014001.4. [10.7567/APEX.9.014001]

Tunable single hole regime of a silicon field effect transistor in standard CMOS technology

E. Prati
Ultimo
2016

Abstract

The electrical properties of a Single Hole Field Effect Transistor (SH-FET) based on CMOS technology are analyzed in a cryogenic environment. Few electron-hole Coulomb diamonds are observed using quantum transport spectroscopy measurements, down to the limit of single hole transport. Controlling the hole filling of the SH-FET is made possible by biasing the top gate, while the bulk contact is employed as a back gate that tunes the hole state coupling with the contacts and their distance from the interface. We compare the cryogenic Coulomb blockade regime with the room temperature regime, where the device operation is similar to that of a standard p-MOSFET.
English
negative differential conductance; quantum-dot; QUBIT
Settore FIS/03 - Fisica della Materia
Articolo
Esperti anonimi
Pubblicazione scientifica
2016
9
1
014001
1
4
4
Pubblicato
Periodico con rilevanza internazionale
miur
MIUR-MANUAL
NON aderisco
info:eu-repo/semantics/article
Tunable single hole regime of a silicon field effect transistor in standard CMOS technology / M. Turchetti, H. Homulle, F. Sebastiano, G. Ferrari, E. Charbon, E. Prati. - In: APPLIED PHYSICS EXPRESS. - ISSN 1882-0778. - 9:1(2016), pp. 014001.1-014001.4. [10.7567/APEX.9.014001]
none
Prodotti della ricerca::01 - Articolo su periodico
6
262
Article (author)
no
M. Turchetti, H. Homulle, F. Sebastiano, G. Ferrari, E. Charbon, E. Prati
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/2434/908777
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