The redox process of pretreated Co3O4 thin film coatings has been studied by ambient pressure soft X-ray absorption spectroscopy. The Co3O4 coatings were composed of nanoparticles of about 10 nm in size as prepared by pulsed laser deposition. The thin film coatings were pretreated in He or in H2 up to 150 °C prior to exposure to the reactive gases. The reactivity toward carbon monoxide and oxygen was monitored by near-edge X-ray absorption fine structure (NEXAFS) spectroscopy during gas exposures. The results indicate that the samples pretreated in He show reactivity only at high temperature, while the samples pretreated in H2 are reactive also at room temperature. X-ray photoemission spectroscopy measurements in ultra-high vacuum and NEXAFS simulations with the CTM4XAS code further specify the results.

Study of Gaseous Interactions on Co3O4 Thin Film Coatings by Ambient Pressure Soft X-ray Absorption Spectroscopy / R. Edla, L. Braglia, V. Bonanni, A. Miotello, G. Rossi, P. Torelli. - In: JOURNAL OF PHYSICAL CHEMISTRY. C.. - ISSN 1932-7455. - 123:40(2019 Oct), pp. 24511-24519. [10.1021/acs.jpcc.9b05433]

Study of Gaseous Interactions on Co3O4 Thin Film Coatings by Ambient Pressure Soft X-ray Absorption Spectroscopy

V. Bonanni;G. Rossi
Penultimo
;
2019

Abstract

The redox process of pretreated Co3O4 thin film coatings has been studied by ambient pressure soft X-ray absorption spectroscopy. The Co3O4 coatings were composed of nanoparticles of about 10 nm in size as prepared by pulsed laser deposition. The thin film coatings were pretreated in He or in H2 up to 150 °C prior to exposure to the reactive gases. The reactivity toward carbon monoxide and oxygen was monitored by near-edge X-ray absorption fine structure (NEXAFS) spectroscopy during gas exposures. The results indicate that the samples pretreated in He show reactivity only at high temperature, while the samples pretreated in H2 are reactive also at room temperature. X-ray photoemission spectroscopy measurements in ultra-high vacuum and NEXAFS simulations with the CTM4XAS code further specify the results.
XAS, NEXAFS, ambient pressure, in-operando
Settore FIS/03 - Fisica della Materia
ott-2019
9-set-2019
Article (author)
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/2434/679284
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