Photolithography is a process in the production of integrated circuits in which a mask is used to create an exposed pattern with a desired geometric shape. In the inverse problem of photolithography, a desired pattern is given and the mask that produces an exposed pattern which is close to the desired one is sought. We propose a variational approach formulation of this shape design problem and introduce a regularization strategy. The main novelty in this work is the regularization term that makes the thresholding operation involved in photolithography stable. The potential of the method is demonstrated in numerical experiments.
|Titolo:||A variational approach to the inverse photolithography problem|
RONDI, LUCA (Corresponding)
|Parole Chiave:||photolithograpy, shape optimization, inverse problem, calculus of variations, sets of finite perimeter, Gamma-convergence|
|Settore Scientifico Disciplinare:||Settore MAT/05 - Analisi Matematica|
|Data di pubblicazione:||2016|
|Digital Object Identifier (DOI):||10.1137/140991868|
|Appare nelle tipologie:||01 - Articolo su periodico|