The limiting effects to the performances of an optical device, such as an XUV monochromator inserted in a synchrotron radiation facility, are mainly manufacturing slope errors and thermal loads induced by the optical beam itself. We have performed numerical simulations on such effects in the low energy section of a high resolution, wide spectral range monochromator for the storage ring ELETTRA in Trieste. The instrument will be used in the dedicated surface physics beamline ALOISA (advanced line for overlayer interface and surface analysis). Thermal effects have been evaluated by using finite element analysis. Thermal induced deformations and slope errors have been included in a ray tracing program. The resulting aberrations at the output of the instrument have been evaluated for the extreme conditions of maximum power density and asymmetrical illumination of the second mirror. The results stress the relevance of manufacturing slope errors in limiting spatial and spectral resolution.
|Titolo:||Degradation of Image Quality Induced by Thermal Loads and Slope Errors in a XUV High Resolution Synchrotron Radiation Monochromator|
|Parole Chiave:||Finite-element and Galerkin methods ; Lenses, prisms and mirrors ; Wave fronts and ray tracing ; Optical Aberrations|
|Settore Scientifico Disciplinare:||Settore FIS/01 - Fisica Sperimentale|
|Data di pubblicazione:||mag-1994|
|Digital Object Identifier (DOI):||10.1088/0963-9659/3/3/016|
|Appare nelle tipologie:||01 - Articolo su periodico|