We present a study on electrical conduction in nanostructured carbon films produced by deposition of a supersonic beam of neutral carbon clusters. The electrical transport properties have been investigated by measuring the electrical conductance both in-situ, during the film deposition, and ex-situ, after the film exposure to ambient air. The I-V characteristic indicates a strict ohmic behavior all over the measured electric field range up to (2 kV/cm). Changes in the electrical conductance have been observed due to gas adsorption-desorption mechanisms. The exposure to air leads to a passivation of the film with an increase of resistivity up to ∼ 0.1 GΩ.cm. Current-temperature characteristics measured in vacuum in the temperature range 150-400 K, both in-situ and ex-situ, indicate a thermally activated conductivity with energy of ∼ 0.3 eV.

Electrical conduction in nanostructured carbon films produced by supersonic cluster beam deposition / M. Bruzzi, P. Piseri, E. Barborini, G. Benedek, P. Milani. - In: DIAMOND AND RELATED MATERIALS. - ISSN 0925-9635. - 10:3-7(2001), pp. 989-992. ((Intervento presentato al 11. convegno European Conference on Diamond, Diamond-like Materials, Carbon Nanotubes, Nitrides and Silicon Carbide (Diamond 2000) tenutosi a OPORTO, PORTUGAL nel 2000.

Electrical conduction in nanostructured carbon films produced by supersonic cluster beam deposition

P. Piseri
Secondo
;
P. Milani
Ultimo
2001

Abstract

We present a study on electrical conduction in nanostructured carbon films produced by deposition of a supersonic beam of neutral carbon clusters. The electrical transport properties have been investigated by measuring the electrical conductance both in-situ, during the film deposition, and ex-situ, after the film exposure to ambient air. The I-V characteristic indicates a strict ohmic behavior all over the measured electric field range up to (2 kV/cm). Changes in the electrical conductance have been observed due to gas adsorption-desorption mechanisms. The exposure to air leads to a passivation of the film with an increase of resistivity up to ∼ 0.1 GΩ.cm. Current-temperature characteristics measured in vacuum in the temperature range 150-400 K, both in-situ and ex-situ, indicate a thermally activated conductivity with energy of ∼ 0.3 eV.
Settore FIS/03 - Fisica della Materia
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Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/2434/183780
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