A wide variety of preparatively useful reactions involving silicon‐derived Lewis acids are described. The activation of the silicon‐derived Lewis acids employs the concept of Lewis base activation of Lewis acids in which the silicon species is the mediator of the reaction (often incorporated into the product), whereas the Lewis base serves the role of catalyst. The action of trichlorosilane, allyltrichlorosilane, silicon tetrachloride, and their derivatives as promoters of organic reactions is thoroughly described through preparative examples and mechanistic considerations. A variety of highly diastereo‐ and enantioselective transformations are discussed in detail organized by the role of the silicon species.
Lewis Base Activation of Silicon Lewis Acids / S. Rossi, S.E. Denmark - In: Organosilicon Chemistry : Novel Approaches and Reactions / [a cura di] T. Hiyama, M. Oestreich. - [s.l] : Wiley, 2019 Nov. - ISBN 9783527344536. - pp. 333-415 [10.1002/9783527814787.ch10]
Lewis Base Activation of Silicon Lewis Acids
S. Rossi
;
2019
Abstract
A wide variety of preparatively useful reactions involving silicon‐derived Lewis acids are described. The activation of the silicon‐derived Lewis acids employs the concept of Lewis base activation of Lewis acids in which the silicon species is the mediator of the reaction (often incorporated into the product), whereas the Lewis base serves the role of catalyst. The action of trichlorosilane, allyltrichlorosilane, silicon tetrachloride, and their derivatives as promoters of organic reactions is thoroughly described through preparative examples and mechanistic considerations. A variety of highly diastereo‐ and enantioselective transformations are discussed in detail organized by the role of the silicon species.File | Dimensione | Formato | |
---|---|---|---|
9783527814787.ch10.pdf
accesso riservato
Tipologia:
Publisher's version/PDF
Dimensione
1.18 MB
Formato
Adobe PDF
|
1.18 MB | Adobe PDF | Visualizza/Apri Richiedi una copia |
Pubblicazioni consigliate
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.