Transparent conductive oxides like indium tin oxide (ITO) play a pivotal role in a wide range of innovative applications, such as new generations of solar cells. In many of these applications the tailoring of surface properties on the nanometer scale represents a highly desirable target. The local oxidation of self-assembled monolayers (SAMs) using a scanning probe is a promising technique to achieve surface modifications on the nanometer scale. So far, electro-oxidative lithography of SAMs has been reported mainly on Si wafers while there are no previous reports on transparent oxides. Here, we report the oxidative lithography of n-octadecyltrichlorosilane (OTS) SAM deposited onto an ITO layer. A local overoxidation of the substrate is observed while the simultaneously occurring monolayer oxidation is indirectly confirmed by the site-selective deposition of silver nanoparticles onto electro-oxidized areas. The process of lithography is compared to that on OTS-Si substrates and its mechanism is systematically investigated by means of scanning Kelvin probe microscopy (SKPM). Chemically active nanostructures are created on transparent n-octadecyltrichlorosilane coated indium tin oxide substrates by electro-oxidative probe lithography. In addition to being a study of diamond substrates, this is the first example that the tip-mediated oxidation process can be performed on substrates other than silicon. Detailed comparative studies of the oxidation process by the site-selective, template-mediated synthesis of nanoparticles and scanning Kelvin probe microscopy reveal the similarity of the oxidation processes.
Probe-Based Electro-Oxidative Lithography of OTS SAMs Deposited onto Transparent ITO Substrates / D. Meroni, S. Ardizzone, U.S. Schubert, S. Höppener. - In: ADVANCED FUNCTIONAL MATERIALS. - ISSN 1616-301X. - 22:20(2012), pp. 4376-4382. [10.1002/adfm.201200673]
Probe-Based Electro-Oxidative Lithography of OTS SAMs Deposited onto Transparent ITO Substrates
D. MeroniPrimo
;S. ArdizzoneSecondo
;
2012
Abstract
Transparent conductive oxides like indium tin oxide (ITO) play a pivotal role in a wide range of innovative applications, such as new generations of solar cells. In many of these applications the tailoring of surface properties on the nanometer scale represents a highly desirable target. The local oxidation of self-assembled monolayers (SAMs) using a scanning probe is a promising technique to achieve surface modifications on the nanometer scale. So far, electro-oxidative lithography of SAMs has been reported mainly on Si wafers while there are no previous reports on transparent oxides. Here, we report the oxidative lithography of n-octadecyltrichlorosilane (OTS) SAM deposited onto an ITO layer. A local overoxidation of the substrate is observed while the simultaneously occurring monolayer oxidation is indirectly confirmed by the site-selective deposition of silver nanoparticles onto electro-oxidized areas. The process of lithography is compared to that on OTS-Si substrates and its mechanism is systematically investigated by means of scanning Kelvin probe microscopy (SKPM). Chemically active nanostructures are created on transparent n-octadecyltrichlorosilane coated indium tin oxide substrates by electro-oxidative probe lithography. In addition to being a study of diamond substrates, this is the first example that the tip-mediated oxidation process can be performed on substrates other than silicon. Detailed comparative studies of the oxidation process by the site-selective, template-mediated synthesis of nanoparticles and scanning Kelvin probe microscopy reveal the similarity of the oxidation processes.File | Dimensione | Formato | |
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